Deep anisotropic ICP plasma etching designed for high volume MEMS manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3874, Issue , 1999, Pages 218-226

  Yu, K ^a   Feldbaum, M ^a   Pandhumsoporn, T ^a   Gadgil, P ^a  

^a USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; AUTOMOBILE PARTS AND EQUIPMENT; CMOS INTEGRATED CIRCUITS; MASKS; MICROMACHINING; OXIDES; PLASMA ETCHING; RELIABILITY; SENSORS; SILICON ON INSULATOR TECHNOLOGY; THROUGHPUT;

INDUCTIVE COUPLED PLASMA ETCHING; MICROELECTROMECHANICAL SYSTEM MANUFACTURING;

MICROELECTROMECHANICAL DEVICES;

EID: 0033309895     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)