16 k infrared micromirror arrays with large beam deflection and tenth millimeter pixel size

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3878, Issue , 1999, Pages 272-280

  Reimer, K ^a   Engelke, R ^a   Witt, M ^a   Wagner, B ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; ELECTROPLATING; ELECTROSTATICS; INFRARED DEVICES; LITHOGRAPHY; MICROELECTRONIC PROCESSING; MICROMACHINING; OPTICAL SWITCHES;

COPPER SACRIFICIAL LAYER; INFRARED MICROMIRROR ARRAYS; MICROFABRICATION; MICROSYSTEMS; THICK RESIST TECHNOLOGY;

MIRRORS;

EID: 0033309877     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)