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Volumn 1, Issue , 1999, Pages 14-17
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Lateral SPE recovery of implanted source/drain in thin SOI MOSFETs
a
a
HITACHI LTD
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHIZATION;
AMORPHOUS MATERIALS;
CRYSTAL DEFECTS;
CRYSTAL ORIENTATION;
CRYSTALLIZATION;
EPITAXIAL GROWTH;
GATES (TRANSISTOR);
INTERFACES (MATERIALS);
ION IMPLANTATION;
SILICON ON INSULATOR TECHNOLOGY;
SINGLE CRYSTALS;
TRANSMISSION ELECTRON MICROSCOPY;
SOLID-PHASE EPITAXY (SPE);
MOSFET DEVICES;
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EID: 0033309648
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (1)
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References (12)
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