Thin film transistors of microcrystalline silicon deposited by plasma enhanced-CVD

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 665-670

  Chen, Y ^a   Wagner, S ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; CRYSTALLINE MATERIALS; ELECTRIC FIELD EFFECTS; ELECTRONIC STRUCTURE; FILM GROWTH; MIXTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE; SILICON;

FLOW RATIO; MICROCRYSTALLINE SILICON; POWER DENSITY; SUBTHRESHOLD SLOPE;

THIN FILM TRANSISTORS;

EID: 0033300314     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-665     Document Type: Article

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