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Materials Research Society Symposium - Proceedings

Volumn 565, Issue , 1999, Pages 117-122

Chemical and thermal stability of fluorinated amorphous carbon films for interlayer dielectric applications

(5) Chang, J P a Krautter, H W a Zhu, W a Opila, R L a Pai, C S a

a LUCENT TECHNOLOGIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; FLUORINE; GRAPHITE; MASS SPECTROMETRY; POLYTETRAFLUOROETHYLENES; SPUTTER DEPOSITION; TANTALUM COMPOUNDS; THERMODYNAMIC STABILITY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

FLUORINATED AMORPHOUS CARBON; INTERLAYER DIELECTRIC; TANTALUM FLUORIDE; TANTALUM NITRIDE;

DIELECTRIC FILMS;

EID: 0033300134 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-565-117 Document Type: Article

Times cited : (3)

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