Plasma etching conditioning of textured crystalline silicon surfaces for a-Si/c-Si heterojunctions

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 585-590

  De Rosa, R ^a   Addonizio, M L ^a   Chiacchio, E ^a   Roca, F ^a   Tucci, M ^a  

^a ENEA CR Portici   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DRY ETCHING; HETEROJUNCTIONS; MORPHOLOGY; PHOTOVOLTAIC CELLS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SOLAR CELLS; SUBSTRATES;

CRYSTALLINE WAFER; PHOTOVOLTAIC CONVERSION EFFICIENCY; POLYCRYSTALLINE SILICON;

AMORPHOUS SILICON;

EID: 0033299964     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (7)

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