Anisotropy in hydrogenated amorphous silicon films as observed using polarized FTIR-ATR spectroscopy

Materials Research Society Symposium - Proceedings

Volumn 557, Issue , 1999, Pages 311-316

  Webb, J D ^a   Gedvilas, L M ^a   Grand All, R S ^a   Iwaniczko, E ^a   Nelson, B P ^a   Mahan, A H ^a   Reedy, R ^a   Maison, R J ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANISOTROPY; CRYSTALLINE MATERIALS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; OPTICAL VARIABLES MEASUREMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING CADMIUM TELLURIDE;

HOT WIRE CHEMICAL VAPOR DEPOSITION; LATTICE ABSORPTION; POLARIZED ATTENUATED TOTAL REFLECTION; STRETCHING VIBRATION; VIBRATIONAL SPECTRA; WAGGING MODE ABSORPTION BAND;

THIN FILMS;

EID: 0033297424     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-557-311     Document Type: Article

References (10)

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