Epitaxial ZnO films on non-crystalline substrates

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 68, Issue 1, 1999, Pages 56-58

  Ataev, B M ^a   Kamilov, I K ^a   Bagamadova, A M ^a   Mamedov, V V ^a   Omaev, A K ^a   Rabadanov, M Kh ^a  

^a INSTITUTE OF PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; FILM PREPARATION; FUSED SILICA; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SINGLE CRYSTALS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THIN FILMS;

AUTOEPITAXIAL GROWTH;

ZINC OXIDE;

EID: 0033285869     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00336-0     Document Type: Article

References (7)

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5. Abduev A.Kh., Ataev B.M., Bagamadova A.M. Izvestiya AN SSSR. Neorg. Mat. 11:1987;1928. In Russian.
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7. Ataev B.M., Bagamadova A.M., Mamedov V.V. Thin Solid Films. 283:1996;5.