Computationally efficient method for three-dimensional simulation of ion implantation

International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

Volumn , Issue , 1999, Pages 55-58

  Burenkov, A ^a   Tietzel, K ^a   Hoessinger, A ^a   Lorenz, J ^a   Ryssel, H ^a   Selberherr, S ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; MONTE CARLO METHODS; PROCESS ENGINEERING;

MONTE CARLO ION IMPLANTATION SIMULATION METHODS;

ION IMPLANTATION;

EID: 0033283448     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)