Successful application of WLR fast test on Al via process optimization

International Integrated Reliability Workshop Final Report

Volumn , Issue , 1999, Pages 74-77

  Liu, X ^a   Lo, K F ^a   Guo, Q ^a   Cai, J ^a  

^a Chartered Semiconductor   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ELECTRIC RESISTANCE; ETCHING; GLASS; OPTIMIZATION; SILICON WAFERS; SPUTTERING;

PRE-SPUTTER ETCH (PSE); SPIN-ON-GLASS (SOG); STANDARD WAFER-LEVEL ELECTROMIGRATION ACCELERATED TESTS (SWEAT);

ELECTROMIGRATION;

EID: 0033282992     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)