High energy density capacitors fabricated by thin film technology

Materials Research Society Symposium - Proceedings

Volumn 574, Issue , 1999, Pages 219-224

  Wagner, Andrew V ^a   Johnson, Gary W ^a   Barbee Jr , Troy W ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CAPACITANCE; DIELECTRIC FILMS; ELECTRIC FIELD EFFECTS; MAGNETRON SPUTTERING; MULTILAYERS; PERMITTIVITY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SPUTTER DEPOSITION; THIN FILM DEVICES;

DIELECTRIC BREAKDOWN STRENGTH; HIGH ENERGY DENSITY CAPACITORS;

CERAMIC CAPACITORS;

EID: 0033279039     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-574-219     Document Type: Article

References (6)

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