Internal friction of artificially multilayered Cu-Ni(100) membranes produced by electrodeposition

Journal of Materials Research

Volumn 14, Issue 10, 1999, Pages 3837-3839

  Oberle, R R ^a   Cammarata, R C ^a   Su, C M ^b   Wuttig, M ^b  

^a Johns Hopkins University   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; INTERNAL FRICTION; MEMBRANES; MONEL METAL; MULTILAYERS; RESIDUAL STRESSES; THERMAL STRESS; THIN FILMS;

SENSITIVE VIBRATING MEMBRANE TECHNIQUE;

METALLIC FILMS;

EID: 0033276881     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0517     Document Type: Article

References (9)

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3. C.M. Su, R.R. Oberle, R.C. Cammarata, and M. Wuttig, in Evolution of Surface Thin Film Microstructure, edited by H.A. Atwater, E.H. Chason, M.L. Grabow and M.G. Lagally, (Mater. Res. Soc. Symp. Proc. 280, Pittsburgh, PA, 1993), p. 527.
4. I.K. Schuller, Phys. Rev. Lett. 44, 1597 (1980).
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7. A.S. Norwick and B.S. Berry, Anelastic Relaxation in Crystalline Solids (Academic, New York, 1972), p. 19.
8. C.M. Su, T. Kim, R.R. Oberle, R.C. Cammarata, and M. Wuttig, J. Appl. Phys. 76, 4567 (1994).
9. R.R. Oberle, M.S. Thesis, Johns Hopkins University, Baltimore, MD, 1992.