As2S3 and AgI thin layers as ion sensitive membranes

Journal of Non-Crystalline Solids

Volumn 260, Issue 3, 1999, Pages 195-198

  Tomova, R ^a   Assa, J ^a   Stoycheva Topalova, R ^a   Buroff, A ^a  

^a CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC COMPOUNDS; DEPOSITION; ELECTROCHEMISTRY; SEMICONDUCTOR DOPING; SILVER COMPOUNDS; SUBSTRATES; THIN FILMS;

ION SELECTIVE FIELD EFFECT TRANSISTORS (ISFET); ION SENSITIVE MEMBRANES; VACUUM DEPOSITION;

FIELD EFFECT TRANSISTORS;

EID: 0033276762     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(99)00574-8     Document Type: Article

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