The etching mechanism of (Ba,Sr)TiO3 films using Cl2/Ar inductively coupled plasma

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 4, 1999, Pages

  Kim, Seung Bum ^a   Chang, Eui Goo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033266358     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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