Preparation and characterization of chemically deposited As2S3 thin films

Indian Journal of Pure and Applied Physics

Volumn 37, Issue 3, 1999, Pages 196-198

  Mane, R S ^a   Lokhande, B J ^a   Uplane, M D ^a   Lokhande, C D ^a  

^a SHIVAJI UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033241405     PISSN: 00195596     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (4)

1. Kale S S, Jadhav V S & Lokhande C D, Indian J of Pure & Appl Phys, 34 (1996) 324-327.
2. Hodes G, Fonash S J, Heller A & Miller B, Adv Electrochem Engg, 13 (1985) 113.
3. Amalnekar D P, Minoura H & Yamaguch K, J Chem Soc Japan, (1994) 339.
4. Contrell A, Introduction to metallurgy (Arnold, London), 1975, 173.