Rapid thermal processing of TiN coatings deposited by chemical and physical vapor deposition using a low-energy, high-current electron beam: Microstructural studies and properties

Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science

Volumn 30, Issue 11, 1999, Pages 2931-2939

  Perry, Anthony J ^a   Matossian, Jesse N ^b   Bull, Steve J ^c   Proskurovsky, Dmitri I ^d   Rice Evans, Peter C ^e   Page, Trevor F ^c   Geist, Daniel E ^f   Taylor, James ^e   Vajo, John J ^b   Doty, Robert E ^b   Rotshtein, Vladimir P ^d   Markov, Alexey B ^d  

^a AIMS Marketing   (United States)

^b Hughes Aircraft Co   (United States)

^c NEWCASTLE UNIVERSITY   (United Kingdom)

^d INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

^e UNIVERSITY OF LONDON   (United Kingdom)

^f Analytical Reference Materials International   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBIDE CUTTING TOOLS; CHEMICAL VAPOR DEPOSITION; COBALT; ELECTRON BEAMS; INORGANIC COATINGS; MICROSTRUCTURE; RESIDUAL STRESSES; STOICHIOMETRY;

PHYSICAL VAPOR DEPOSITION (PVD); RAPID THERMAL PROCESSING (RTP);

TITANIUM NITRIDE;

EID: 0033225821     PISSN: 10735623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11661-999-0130-9     Document Type: Article

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