-
1
-
-
0002313839
-
Microsecond duration optical pulses from a UV-preionized XeCl laser
-
R. S. Taylor and K. E. Leopold, "Microsecond duration optical pulses from a UV-preionized XeCl laser," Appl. Phys. Lett., vol. 47, no. 2, pp. 81-83, 1985.
-
(1985)
Appl. Phys. Lett.
, vol.47
, Issue.2
, pp. 81-83
-
-
Taylor, R.S.1
Leopold, K.E.2
-
2
-
-
0008633306
-
Ultralong optical-pulse corona preionized XeCl laser
-
R. S. Taylor and K. E. Leopold, "Ultralong optical-pulse corona preionized XeCl laser," J. Appl. Phys., vol. 65, no. 1, pp. 22-29, 1989.
-
(1989)
J. Appl. Phys.
, vol.65
, Issue.1
, pp. 22-29
-
-
Taylor, R.S.1
Leopold, K.E.2
-
3
-
-
36448999457
-
Long pulse KrCl excimer laser at 222 nm
-
J.-M. Hueber, B. L. Fontaine, N. Bernard, B. M. Forestier, M. L. Sentis, and Ph. C. Delaporte, "Long pulse KrCl excimer laser at 222 nm," Appl. Phys. Lett., vol. 61, no. 19, pp. 2269-2271, 1992.
-
(1992)
Appl. Phys. Lett.
, vol.61
, Issue.19
, pp. 2269-2271
-
-
Hueber, J.-M.1
Fontaine, B.L.2
Bernard, N.3
Forestier, B.M.4
Sentis, M.L.5
Delaporte, Ph.C.6
-
4
-
-
0002139921
-
Long pulse operation of an X-ray preionized molecular fluorine laser excited by a prepulse-main pulse system with a magnetic switch
-
H. M. J. Bastiaens, S. J. M. Peeters, X. Renard, P. J. M. Peters, and W. J. Witteman, "Long pulse operation of an X-ray preionized molecular fluorine laser excited by a prepulse-main pulse system with a magnetic switch," Appl. Phys. Lett., vol. 72, no. 22, pp. 2791-2793, 1998.
-
(1998)
Appl. Phys. Lett.
, vol.72
, Issue.22
, pp. 2791-2793
-
-
Bastiaens, H.M.J.1
Peeters, S.J.M.2
Renard, X.3
Peters, P.J.M.4
Witteman, W.J.5
-
5
-
-
0000439236
-
Long-duration soft X-ray pulses by XeCl laser driven plasmas and applications
-
S. Bollanti, P. Di Lazarro, F. Flora, G. Giordano, T. Letardi, G. Schina, C. E. Zheng, L. Filippi, L. Palladino, A. Reale, G. Taglieri, D. Batani, A. Mauri, M. Belli, A. Scafati, L. Reale, P. Albertano, A. Grilli, A. Faenov, T. Pikuz, and R. Cotton, "Long-duration soft X-ray pulses by XeCl laser driven plasmas and applications," J. X-Ray Sci. Technol., vol. 5, pp. 261-277, 1995.
-
(1995)
J. X-Ray Sci. Technol.
, vol.5
, pp. 261-277
-
-
Bollanti, S.1
Di Lazarro, P.2
Flora, F.3
Giordano, G.4
Letardi, T.5
Schina, G.6
Zheng, C.E.7
Filippi, L.8
Palladino, L.9
Reale, A.10
Taglieri, G.11
Batani, D.12
Mauri, A.13
Belli, M.14
Scafati, A.15
Reale, L.16
Albertano, P.17
Grilli, A.18
Faenov, A.19
Pikuz, T.20
Cotton, R.21
more..
-
6
-
-
0022669005
-
Stability of transverse self sustained discharge-excited long-pulse XeCl lasers
-
J. Coutts and C. E. Webb, "Stability of transverse self sustained discharge-excited long-pulse XeCl lasers," J. Appl. Phys., vol. 59, no. 3, pp. 704-710, 1986.
-
(1986)
J. Appl. Phys.
, vol.59
, Issue.3
, pp. 704-710
-
-
Coutts, J.1
Webb, C.E.2
-
7
-
-
0022779732
-
Preionization and discharge stability study of long optical pulse duration UV-preionized XeCl lasers
-
R. S. Taylor, "Preionization and discharge stability study of long optical pulse duration UV-preionized XeCl lasers," Appl. Phys. B, vol. 41, pp. 1-24, 1986.
-
(1986)
Appl. Phys. b
, vol.41
, pp. 1-24
-
-
Taylor, R.S.1
-
8
-
-
0026142805
-
Microarcs as a termination mechanism of optical pulses in electric-discharge-excited KrF excimer lasers
-
Apr.
-
M. J. Kushner, "Microarcs as a termination mechanism of optical pulses in electric-discharge-excited KrF excimer lasers," IEEE Trans. Plasma Sci., vol. 19, pp. 387-399, Apr. 1991.
-
(1991)
IEEE Trans. Plasma Sci.
, vol.19
, pp. 387-399
-
-
Kushner, M.J.1
-
9
-
-
0028755221
-
High average power XeCl laser with X-ray preionization and spiker-sustainer excitation,"
-
M. Bohrer, T. Letardi, D. Schuöcker, and H. Weber, Eds.
-
F. A. van Goor, W. J. Witteman, J. C. M. Timmermans, J. van Spijker, and J. Couperus, "High average power XeCl laser with X-ray preionization and spiker-sustainer excitation," in Proc. SPIE, High-Power Gas and Solid State Lasers, M. Bohrer, T. Letardi, D. Schuöcker, and H. Weber, Eds., 1994, vol. 2206, pp. 30-40.
-
(1994)
Proc. SPIE, High-Power Gas and Solid State Lasers
, vol.2206
, pp. 30-40
-
-
Van Goor, F.A.1
Witteman, W.J.2
Timmermans, J.C.M.3
Van Spijker, J.4
Couperus, J.5
-
10
-
-
0028539456
-
Magnetic-spiker excitation of gas-discharge lasers
-
R. S. Taylor and K. E. Leopold, "Magnetic-spiker excitation of gas-discharge lasers," Appl. Phys. B, vol. 59, pp. 479-508, 1994.
-
(1994)
Appl. Phys. b
, vol.59
, pp. 479-508
-
-
Taylor, R.S.1
Leopold, K.E.2
-
11
-
-
0343510804
-
-
Ph.D. dissertation, Univ. of Twente, Enschede, The Netherlands
-
J. C. M. Timmermans, "Double discharge XeCl-laser," Ph.D. dissertation, Univ. of Twente, Enschede, The Netherlands, 1995.
-
(1995)
Double Discharge XeCl-laser
-
-
Timmermans, J.C.M.1
-
12
-
-
0021393717
-
X-ray preionization of rare-gas-halide lasers
-
Mar.
-
K. Midorikawa, M. Obara, and T. Fujioka, "X-ray preionization of rare-gas-halide lasers," IEEE J. Quantum Electron., vol. QE-20, pp. 198-205, Mar. 1984.
-
(1984)
IEEE J. Quantum Electron.
, vol.QE-20
, pp. 198-205
-
-
Midorikawa, K.1
Obara, M.2
Fujioka, T.3
-
13
-
-
0021390307
-
Uniform-field electrodes with minimum width
-
G. J. Ernst, "Uniform-field electrodes with minimum width," Opt. Commun., vol. 49, no. 4, pp. 275-277, 1984.
-
(1984)
Opt. Commun.
, vol.49
, Issue.4
, pp. 275-277
-
-
Ernst, G.J.1
-
14
-
-
0003462828
-
Development of a long life, 2 kHz repetition rate X-ray preionizer
-
S. J. Scott, "Development of a long life, 2 kHz repetition rate X-ray preionizer," Appl. Phys. B, vol. 56, pp. 201-208, 1993.
-
(1993)
Appl. Phys. B
, vol.56
, pp. 201-208
-
-
Scott, S.J.1
-
15
-
-
0027556032
-
Fast rise time X-ray pre-ionization source using a corona plasma cathode
-
F. A. van Goor, "Fast rise time X-ray pre-ionization source using a corona plasma cathode," J. Phys. D: Appl. Phys., vol. 26, pp. 404-409, 1993.
-
(1993)
J. Phys. D: Appl. Phys.
, vol.26
, pp. 404-409
-
-
Van Goor, F.A.1
-
16
-
-
0001527117
-
High-efficiency operation of a gas discharge XeCl laser using a magnetically induced resonant overshoot circuit
-
J. W. Gerritsen, A. L. Keet, G. J. Ernst, and W. J. Witteman, "High-efficiency operation of a gas discharge XeCl laser using a magnetically induced resonant overshoot circuit," J. Appl. Phys., vol. 67, no. 7, pp. 3517-3519, 1990.
-
(1990)
J. Appl. Phys.
, vol.67
, Issue.7
, pp. 3517-3519
-
-
Gerritsen, J.W.1
Keet, A.L.2
Ernst, G.J.3
Witteman, W.J.4
-
17
-
-
0029289589
-
Light emission during cathode sheath formation in preionized high-pressure glow discharges
-
Apr.
-
R. Dreiskemper, G. Schröder, and W. Bötticher, "Light emission during cathode sheath formation in preionized high-pressure glow discharges," IEEE Trans. Plasma Sci., vol. 23, pp. 180-187, Apr. 1995.
-
(1995)
IEEE Trans. Plasma Sci.
, vol.23
, pp. 180-187
-
-
Dreiskemper, R.1
Schröder, G.2
Bötticher, W.3
-
18
-
-
0029531783
-
Current filamentation of strongly preionized high pressure glow discharges in Ne/Xe/HCl mixtures
-
Dec.
-
R. Dreiskemper and W. Bötticher, "Current filamentation of strongly preionized high pressure glow discharges in Ne/Xe/HCl mixtures," IEEE Trans. Plasma Sci., vol. 23, pp. 987-995, Dec. 1995.
-
(1995)
IEEE Trans. Plasma Sci.
, vol.23
, pp. 987-995
-
-
Dreiskemper, R.1
Bötticher, W.2
-
19
-
-
0032050145
-
High efficiency discharge-pumped XeCl laser
-
M. Makarov, J. Bonnet, and D. Pigache, "High efficiency discharge-pumped XeCl laser," Appl. Phys. B, vol. 66, pp. 417-426, 1998.
-
(1998)
Appl. Phys. b
, vol.66
, pp. 417-426
-
-
Makarov, M.1
Bonnet, J.2
Pigache, D.3
-
20
-
-
0032094685
-
Measurement of temporal behavior of electron density in a discharge-pumped ArF excimer laser
-
Aug.
-
S. Nagai, H. Furuhashi, A. Kono, Y. Uchida, and T. Goto, "Measurement of temporal behavior of electron density in a discharge-pumped ArF excimer laser," IEEE J. Quantum Electron., vol. 34, pp. 942-948, Aug. 1998.
-
(1998)
IEEE J. Quantum Electron.
, vol.34
, pp. 942-948
-
-
Nagai, S.1
Furuhashi, H.2
Kono, A.3
Uchida, Y.4
Goto, T.5
-
21
-
-
85088333467
-
On the performance of an ArF and a KrF laser as a function of the preionization timing and the excitation mode
-
[On-line]. Available: DOI 10.1007/s003409900119
-
L. Feenstra, O. B. Hoekstra, P. J. M. Peters, and W. J. Witteman, On the performance of an ArF and a KrF laser as a function of the preionization timing and the excitation mode. Appl. Phys. B. [On-line]. Available: DOI 10.1007/s003409900119.
-
Appl. Phys. B.
-
-
Feenstra, L.1
Hoekstra, O.B.2
Peters, P.J.M.3
Witteman, W.J.4
-
22
-
-
0020234813
-
Negative ion formation in gas lasers
-
E. W. McDaniel and W. L. Nighan, Eds. New York: Academic
-
P. J. Chantry, "Negative ion formation in gas lasers," in Appplied Atomic Collision Physics, Gas Lasers, E. W. McDaniel and W. L. Nighan, Eds. New York: Academic, vol. 3, pp. 35-70, 1982.
-
(1982)
Appplied Atomic Collision Physics, Gas Lasers
, vol.3
, pp. 35-70
-
-
Chantry, P.J.1
-
23
-
-
0030085365
-
The influence of charge-mode operation of a XeCl laser on the beam profile
-
F. A. van Goor, J. C. M. Timmermans, and W. J. Witteman, "The influence of charge-mode operation of a XeCl laser on the beam profile," Opt. Commun., vol. 124, pp. 56-62, 1996.
-
(1996)
Opt. Commun.
, vol.124
, pp. 56-62
-
-
Van Goor, F.A.1
Timmermans, J.C.M.2
Witteman, W.J.3
-
24
-
-
36549091677
-
Theoretical evaluation of the buffergas effects for a self sustained discharge ArF laser
-
M. Ohwa and M. Obara, "Theoretical evaluation of the buffergas effects for a self sustained discharge ArF laser," J. Appl. Phys., vol. 63, no. 5, pp. 1306-1312, 1988.
-
(1988)
J. Appl. Phys.
, vol.63
, Issue.5
, pp. 1306-1312
-
-
Ohwa, M.1
Obara, M.2
-
25
-
-
0001119504
-
Kinetic model of an ArF laser
-
A. M. Boichenko, V. I. Derzhiev, A. G. Zhidkov, and S. I. Yakovlenko, "Kinetic model of an ArF laser," Sov. J. Quantum Electron., vol. 22, no. 5, pp. 444-448, 1992.
-
(1992)
Sov. J. Quantum Electron.
, vol.22
, Issue.5
, pp. 444-448
-
-
Boichenko, A.M.1
Derzhiev, V.I.2
Zhidkov, A.G.3
Yakovlenko, S.I.4
-
26
-
-
0029757190
-
The upper energy limit of a self sustained discharge-pumped ArF laser
-
D. Lo, A.I. Shchedrin, and A. V. Ryabtsev, "The upper energy limit of a self sustained discharge-pumped ArF laser," J. Phys. D: Appl. Phys., vol. 29, pp. 43-49, 1996.
-
(1996)
J. Phys. D: Appl. Phys.
, vol.29
, pp. 43-49
-
-
Lo, D.1
Shchedrin, A.I.2
Ryabtsev, A.V.3
-
27
-
-
0342640534
-
Kinetic modeling of a discharge pumped ArF excimer laser
-
submitted for publication
-
A. V. Demyanov, L. Feenstra, P. J. M. Peters, A. P. Napartovich, and W. J. Witteman, "Kinetic modeling of a discharge pumped ArF excimer laser," J. Phys. D: Appl. Phys., submitted for publication.
-
J. Phys. D: Appl. Phys.
-
-
Demyanov, A.V.1
Feenstra, L.2
Peters, P.J.M.3
Napartovich, A.P.4
Witteman, W.J.5
-
28
-
-
0031647676
-
2 molecules on the oscillation process of a discharge-pumped ArF excimer laser
-
Jan.
-
2 molecules on the oscillation process of a discharge-pumped ArF excimer laser," IEEE J. Quantum Electron., vol. 34, pp. 40-46, Jan. 1998.
-
(1998)
IEEE J. Quantum Electron.
, vol.34
, pp. 40-46
-
-
Nagai, S.1
Sakai, M.2
Furuhashi, H.3
Kono, A.4
Goto, T.5
Uchida, Y.6
-
29
-
-
0028447740
-
Modeling of a self sustained discharge-excited ArF excimer laser
-
H. Akashi, Y. Sakai, and H. Tagashira, "Modeling of a self sustained discharge-excited ArF excimer laser," J. Phys. D: Appl. Phys., vol. 27, pp. 1097-1106, 1994.
-
(1994)
J. Phys. D: Appl. Phys.
, vol.27
, pp. 1097-1106
-
-
Akashi, H.1
Sakai, Y.2
Tagashira, H.3
-
30
-
-
0018445023
-
Formation and quenching of excimers in low-pressure rare-gas/halogen mixtures by e-beam excitation
-
M. Maeda, T. Nishitarumizu, and Y. Miyazoe, "Formation and quenching of excimers in low-pressure rare-gas/halogen mixtures by e-beam excitation," Jpn. J. Appl. Phys., vol. 18, no. 3, pp. 439-445, 1979.
-
(1979)
Jpn. J. Appl. Phys.
, vol.18
, Issue.3
, pp. 439-445
-
-
Maeda, M.1
Nishitarumizu, T.2
Miyazoe, Y.3
-
31
-
-
0026404673
-
Plasma physics issues in gas discharge laser development
-
Dec.
-
A. Garscadden, M. J. Kushner, and J. G. Eden, "Plasma physics issues in gas discharge laser development," IEEE Trans. Plasma Sci., vol. 19, pp. 1013-1031, Dec. 1991.
-
(1991)
IEEE Trans. Plasma Sci.
, vol.19
, pp. 1013-1031
-
-
Garscadden, A.1
Kushner, M.J.2
Eden, J.G.3
|