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Volumn 176, Issue 1, 1999, Pages 379-384
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Growth and characterization of thick Si-doped AlGaN epilayers on sapphire substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
CARRIER CONCENTRATION;
CARRIER MOBILITY;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
NITRIDES;
NUCLEATION;
PHOTOLUMINESCENCE;
RAPID THERMAL ANNEALING;
SAPPHIRE;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DOPING;
SUBSTRATES;
ALUMINUM GALLIUM NITRIDES;
MOLE FLOW RATIO;
SEMICONDUCTING FILMS;
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EID: 0033222019
PISSN: 00318965
EISSN: None
Source Type: Journal
DOI: 10.1002/(SICI)1521-396X(199911)176:1<379::AID-PSSA379>3.0.CO;2-V Document Type: Article |
Times cited : (5)
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References (3)
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