Effect of contamination and etching on enamel bond strength of new light-cured glass ionomer cements

Angle Orthodontist

Volumn 69, Issue 5, 1999, Pages 450-456

  Itoh, Takami ^a   Matsuo, Noriatsu ^a   Fukushima, Tadao ^a   Inoue, Yusuke ^b   Oniki, Yasuhisa ^a   Matsumoto, Mitsunari ^a   Caputo, Angelo A ^c  

^a FUKUOKA DENTAL COLLEGE   (Japan)

^b Department of Dental Hygiene   (Japan)

^c UCLA SCHOOL OF DENTISTRY   (United States)

Author keywords

Contamination; Light cured glass ionomer cements; Shear bond strength

Indexed keywords

2 HYDROXYETHYL METHACRYLATE; ACRYLIC ACID RESIN; ALUMINUM SILICATE; CAMPHOROQUINONE; CARBOPOL 940; DENTAL ALLOY; FUJI ORTHO LC; GLASS IONOMER; ITACONIC ACID; METHACRYLIC ACID DERIVATIVE; RESIN CEMENT; SUCCINIC ACID DERIVATIVE; TERPENE; WATER;

ANALYSIS OF VARIANCE; ARTICLE; CHEMISTRY; COMPARATIVE STUDY; DENTAL ACID ETCHING; DENTAL BONDING; ENAMEL; HUMAN; MECHANICAL STRESS; ORTHODONTIC DEVICE; SALIVA; TIME; ULTRASTRUCTURE;

ACID ETCHING, DENTAL; ACRYLIC RESINS; ALUMINUM SILICATES; ANALYSIS OF VARIANCE; DENTAL ALLOYS; DENTAL BONDING; DENTAL ENAMEL; GLASS IONOMER CEMENTS; HUMANS; METHACRYLATES; ORTHODONTIC BRACKETS; RESIN CEMENTS; SALIVA; STRESS, MECHANICAL; SUCCINATES; TERPENES; TIME FACTORS; WATER;

EID: 0033209722     PISSN: 00033219     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

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