Effects of trace O2 levels on the nitriding kinetics of high-purity silicon powders

Journal of the American Ceramic Society

Volumn 82, Issue 10, 1999, Pages 2626-2632

  Parikh, Raju S ^a   Lightfoot, Annamarie ^a   Haggerty, John S ^a   Sheldon, Brian W ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Brown University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NITRIDING; NITROGEN; NUCLEATION; OXIDATION; OXYGEN; PARTIAL PRESSURE; POWDERS; SILICON; SILICON NITRIDE; THERMAL EFFECTS; THERMOGRAVIMETRIC ANALYSIS;

NITRIDING KINETICS;

CERAMIC MATERIALS;

EID: 0033204917     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1999.tb02133.x     Document Type: Article

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