Sheath propagation along the cathode of a plasma opening switch

IEEE Transactions on Plasma Science

Volumn 27, Issue 5, 1999, Pages 1464-1468

  Fruchtman, Amnon ^a   Grossmann, John M ^a   Swanekamp, Stephen B ^a   Ottinger, Paul F ^a  

^a SCIENCE APPLICATIONS INTERNATIONAL CORPORATION   (United States)

Author keywords

Hall effect; Opening switch; Pulsed power; Sheath; Vacuum gap

Indexed keywords

PARTICLE-IN-CELL SIMULATION; PLASMA OPENING SWITCHES;

CATHODES; COMPUTER SIMULATION; ELECTRIC CURRENTS; ELECTRIC SWITCHES; EROSION; HALL EFFECT; MAGNETIC FIELD EFFECTS; MAGNETOHYDRODYNAMICS; MATHEMATICAL MODELS; PLASMA SHEATHS; VACUUM;

PLASMA DEVICES;

EID: 0033204601     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.799827     Document Type: Article

References (16)

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