Tungsten-containing anodic oxide layers on aluminum alloy

Protection of Metals

Volumn 35, Issue 5, 1999, Pages 477-479

  Rudnev, V S ^a   Morozova, V P ^a   Yarovaya, T P ^a   Kaidalova, T A ^a   Gordienko, P S ^a  

^a INSTITUTE OF CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033196891     PISSN: 00331732     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

1. Tekhnologiya tonkikh plenok: Spravochnik (Thin Films Technology. A Handbook), Maiskel, L. and Tangle, R., Eds., Moscow: Sov. Radio, 1977, p. 462.
2. Gruss, L.L. and McNeil, W., Electrochem. Technol., 1963, vol. 1, no. 9-10, p. 283.
3. US Patent 3 293 158.
4. Rudnev, V.S., Yarovaya, T.P., Kon'shina, G.I., et al., Elektrokhimiya, 1996, vol. 32, no. 8, p. 970.
5. Busev, A.I., Ivanova, V.M., and Sokolova, T.A., Analiticheskaya khimiya vol'frama (The Analytical Chemistry of Tungsten), Moscow: Nauka, 1976.
6. Perel'man, F.M. and Zvorykin, A.Ya., Molibden i vol'fram (Molybdenum and Tungsten), Moscow: Nauka, 1968.
7. Mokhosoev, M.V. and Shevtsova, N.A., Sostoyanie ionov molibdena i vol'frama v vodnykh rastvorakh (The State of Molybdenum and Tungsten Ions in Aqueous Solutions), Ulan-Ude, 1977.
8. Artemova, S.Yu., Microplasma Methods of the Formation of Oxide Coatings from Aqueous Electrolytes of Different Composition and Dispersity, Cand. Sci. (Techn.) Dissertation, Moscow, 1996.
9. Li, Y., Shemada, H., Salcairi, M., et al., J. Electrochem. Soc., 1997, vol. 144, no. 3, p. 866.
10. Ragalyavichyus, R. and Yusis, Z., Chemija (Litva), 1992, no. 2, p. 45.