Effects of microscope objectives on magnetic field exposures

Bioelectromagnetics

Volumn 20, Issue 6, 1999, Pages 387-395

  Publicover, Nelson G ^a   Marsh, Carl G ^b   Vincze, Craig A ^b   Craviso, Gale L ^a   Chatterjee, Indira ^c  

^a UNIVERSITY OF NEVADA SCHOOL OF MEDICINE   (United States)

^b UNIVERSITY OF NEVADA   (United States)

^c University of Nevada   (United States)

Author keywords

Helmholtz coils; Imaging; Low frequency electromagnetic field exposure; Microscope

Indexed keywords

ELECTROMAGNETIC FIELD EFFECTS; ELECTROMAGNETIC FIELDS; NICKEL; OPTICAL GLASS; SCREWS;

CHROME PLATING; ELECTROMAGNETIC FIELD EXPOSURE; EXPOSURE SYSTEM; FIELD INTENSITY; HELMHOLTZ COIL; LOW FREQUENCY ELECTROMAGNETIC FIELD; LOW FREQUENCY ELECTROMAGNETIC FIELD EXPOSURE; MAGNETIC-FIELD INTENSITY; MICROSCOPE OBJECTIVE; SPATIAL GRADIENTS;

MICROSCOPES;

ARTICLE; ELECTROMAGNETIC FIELD; INSTRUMENTATION; MAGNETISM; MICROSCOPY; OPTICS; PHYSICS;

ELECTROMAGNETIC FIELDS; MAGNETICS; MICROSCOPY; OPTICS; PHYSICS;

EID: 0033194669     PISSN: 01978462     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1521-186x(199909)20:6<387::aid-bem8>3.0.co;2-%23     Document Type: Article

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