Polar phonon scattering at the Si-SiO2 interface

Microelectronic Engineering

Volumn 48, Issue 1, 1999, Pages 95-99

  Lü, Jian Qiang ^a   Koch, Frederick ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

PHONONS; SCATTERING; SILICA;

POLAR PHONON SCATTERING;

BIPOLAR TRANSISTORS;

EID: 0033190199     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00346-9     Document Type: Article

References (12)

1. K. Hess and P. Vogl, Solid State Commun., 30 (1979) 807.
2. J.-Q. Lü, S. Schottl, E. Stefanov, F. Koch, R. Mahnkopf, and H. Klose, in Defect- and Impurity- Engineered Semiconductors and Devices, edited by Ashok, S.; Chevallier, J.; Akasaki, I.; Johnson, N.M.; Sopori, B.L., (1995) 743.
3. J.-Q. Lü, S. Schottl, F. Koch, R. Mahnkopf, and H. Klose, in Extended Abstracts of the 1995 International Conference on Solid State Devices and Materials, Osaka, (1995) 237.
4. J.-Q. Lü and F. Koch, Jpn. J. Appl. Phys., 35, No 2B (1996) 826.
5. Jian-Qiang Lü, Ph.D. Thesis, Technical University Munich, 1995.
6. G. P. Li, E. Hackbarth and. T. C. Chen, IEEE Trans. Electron Devices 35 (1988) 89.
7. G.A.M. Hurkx, D.B.M. Klaassen and M.P.G. Knuvers, IEEE Trans. Electron Devices, 39 (1992) 331.
8. J. D. Burnett and C. Hu, IEEE Trans. Electron Devices, 35 (1988) 2238.
9. A. Chantre, G. Festes, G. Girout-Matlakowski and A. Nouailhat, IEEE Trans. Electron Devices, 38 (1991) 1354
10. M. Bollu, Ph.D. Thesis, Technical University Munich, 1989.
11. M.J. Kirton and M.J. Uren, Adv. Phys. 38 (1989) 367.
12. A.G. Chynoweth, W.L. Feldmann and R.A. Logan, Phys. Rev. 121 (1961) 684.