In situ monitoring of atmospheric pressure tin oxide CVD : Using near-infrared diode laser spectroscopy

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Holdsworth, R J ^a   Martin, P A ^a   Raisbeck, D ^b   Pemble, M E ^c  

^a UNIVERSITY OF HUDDERSFIELD   (United Kingdom)

^b Pilkington Group Limited   (United Kingdom)

^c UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL REACTIONS; CHEMICAL REACTORS; GLASS; INFRARED SPECTROSCOPY; MONITORING; REAL TIME SYSTEMS; SEMICONDUCTOR LASERS; TIN COMPOUNDS;

ATMOSPHERIC PRESSURE VAPOR CHEMICAL DEPOSITION; NEAR INFRARED DIODE LASER SPECTROSCOPY; TIN OXIDE;

CHEMICAL VAPOR DEPOSITION;

EID: 0033188111     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999814     Document Type: Article

References (7)

1. Giunta C.J., Strickler D.A., Gordon R.G., J. Phys. Cliem. 97 (1993) 2275-2283.
2. Sanders H., "In situ spectroscopic investigation of the gas phase oxidation and hydrolysis of dimethyltin dichloride and the correlation with APCVD SnO2 growth", The 14th International CVD conference and EUROCVD-11, (1997), pp.81-88
3. Martin P.A., C/iem. in Britain, October (1993) 883-886.
4. Feher M., Martin P.A., Spectrochimica Ada A 51 (1995) 1579-1599.
5. Holdsworth R.J., "The design and construction of a protable near-infrared diode laser spectrometer for process and environmental monitoring", PhD Thesis, University of Huddersfield, UK, 1999
6. Holdsworth R.J., Martin P.A., Pemble M. E., Yates R.F., Sanders H., Raisbeck D. "Application of near-infrared diodelaser spectroscopy to semiconductor process monitoring", Condensed Matter and Materials Physics, Manchester 21-23 December 1998,
7. Holdsworth R.J., Martin P.A., Pemble M. E., Raisbeck D., in preparation