In-situ process monitoring of MOCVD of superconducting and dielectric oxide thin films

Journal De Physique. IV : JP

Volumn 9 pt 2, Issue 8, 1999, Pages

  Yamamoto, S ^a   Sugai, S ^a   Oda, S ^a  

^a NONE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; ELLIPSOMETRY; FILM GROWTH; GAS SUPPLY; MONITORING; OXIDE SUPERCONDUCTORS; PROCESS CONTROL; SUPERCONDUCTING FILMS; ULTRASONIC TRANSDUCERS;

DIELECTRIC OXIDES; SPECTROSCOPIC ELLIPSOMETRY;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0033188083     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:19998126     Document Type: Article

References (38)

1. Oda S., Zama H. and Yamamoto S., J. Cryst. Growth 145 (1994) 232-236.
2. Oda S., Yamamoto S. and Kawaguchi A., J. de Physique IV C5 (1995) 379-390.
3. Wang Z. and Oda S., Jpn. J. Appl. Phys. 37 (1998) 942-947.
4. Yamamoto S., Kawaguchi A., Nagata K., Hattori T. and Oda S., Appl. Surf. Sci. 112 (1997) 30-37.
5. Kimura T., Yamauchi H., Machida H., Kokubun H. and Yamada M., Jpn. J. Appl. Phys. 33 (1994) 5119-5124.
6. Richards B.C., Cook S. L., Pinch D. L. and Andrews G. W., J. de Physique IV C5 (1995) 407-414.
7. Ito Y., Yoshida Y., Mizushima Y., Hirabayashi I., Nagai H. and Takai Y., Jpn. J. Appl. Phys. 35 (1996) L825-L827.
8. Yoshida Y., Ito Y., Hirabayashi I., Nagai H. and Takai Y., Appl. Phys. Lett. 69 (1996) 845-847.
9. Zama H. and Morishita T., Jpn. J. Appl. Phys. 35 (1996) L770-L773.
10. Nagai H., Yoshida Y., Ito Y., Taniguchi S., Hirabayashi I., Matsunami N. and Takai Y., Supercond. Sci. Technol. 10 (1997) 213-217.
11. Zama H., Tanaka N. and Morishita T., Mater. Sci. Eng. B 54 (1998) 104-107.
12. Boer H. J., J. de Physique IV C5 (1995) 961-966.
13. Lee W.-J., Basceri C., Streiffer S. K., Kingon A. I., Yang D.-Y., Park Y. and Kim H.-G., Thin Solid Films 323(1998) 285-290.
14. Kawahara T., Yamamuka M., Makita T., Tsutahara K., Yuuki A., Ono K. and Matsui K., Jpn. J. Appl. Phys. 33 (1994) 5897-5902.
15. Kawahara T., Yamamuka M., Makita T., Naka J., Yuuki A., Mikami N. and Ono K., Jpn. J. Appl. Phys. 33 (1994) 5129-5134.
16. Kawahara T., Yamamuka M., Yuuki A. and Ono K., Jpn. J. Appl. Phys. 34 (1995) 5077-5082.
17. Kang C. S., Hwang C. S., Cho H.-J., Lee B. T., Park S. O., Kim J. W., Horii H., Koh Y. B. and Lee M. Y., Jpn. J. Appl. Phys. 35 (1996) 4890-4895.
18. Dahmen K.-H., Carris m. W., J. Alloys Compounds 251 (1997) 270-277.
19. Weiss F., Schmatz U., Pisch A., Felten F., Pignard S., Senateur J. P., Abrutis A., Frohlich K., Selbmann D. and Klippe L., J. Alloys Compounds 251 (1997) 264-269.
20. Hebner G.A., Killeen K.P. and Biefeld R.M., J. Cryst. Growth 98 (1989) 293-301.
21. Graham R.M., Mason N.J., Walker P.J., Frigo D.M. and Gedridge, Jr. R.W., J. Cryst. Growth 124 (1992) 363-370.
22. Stagg J. P., Chemtronics 3 (1988) 44-49.
23. Butler B. R. and Stagg J. P., J. Cryst. Growth 94 (1989) 481-487.
24. Stagg J. P., Christer J., Thrush E. J. and Crawley J., J. Cryst. Growth 120 (1992) 98-102.
25. Musolf J., J. Alloys Compounds 251 (1997) 292-296.
26. Higashiyama K., Hirabayashi I. and Tanaka S., Jpn. J. Appl Phys. 31 (1992) L835-L838.
27. Zama H., Sakai K. and Oda S., Jpn. J. Appl. Phys. 31 (1992) L1243-1245.
28. Sakai K., Zama H. and Oda S., Jpn. J. Appl. Phys. 32 (1993) L683-L686.
29. Oda S., Zama H., Fujii K., Sakai K. and Chen Y. C., Thin Solid Films 225 (1993) 284-287.
30. Oda S., Sakai K. and Zama H., Appl. Surf. Sci. 75 (1994) 259-262.
31. Matsubara M. and Hirabayashi I., Appl. Surf. Sci. 82-83 (1994) 494-500.
32. Kircher J., Alouani M., Garriga M., Murugaraj P., Maier J., Thomsen C., Cardona M., Andersen O. K. and Jepsen O., Phys. Rev. B 40 (1989) 7368-7371.
33. Kircher J., Kelly M. K., Rashkeev S., Alouani M., Fuchs D. and Cardona M., Phys. Rev. B 44 (1991) 217-224.
34. Maruyama K., Shinagawa K., Saito T. and Tsushima T., Jpn. J. Appl. Phys. 34 (1995) L734-L737.
35. Humlicek J., Garria M., and Cardona M., Solid State Comm. 67 (1988) 589-592.
36. Boyn R., Wruck D., Merbach M. and Muller J.-P., Physica C 228 (1994) 49-57.
37. Bijlsma M. E., Wormeester H., Blank D. H. A., Span E., Silfhout A. and Rogalla H., Phys. Rev. B 57 (1998) 13418-13421.
38. Kelly M. K., Chen S.-W., Jenkin, II K., Aspnes D. E., Barboux P. and Tarascon J.-M., Appl. Phys. Lett. 53 (1988) 2333-2335.