Prediction of LPCVD silicon film microstructure from local operating conditions using numerical modeling

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Dollet, A ^a   Gaussat B ^a   Couderc, J P ^b  

^a Centre National de la Recherche Scientifique   (France)

^b LABORATOIRE DE GÉNIE CHIMIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; FILMS; MATHEMATICAL MODELS; PHASE INTERFACES; REACTION KINETICS; SILICON; STATISTICAL METHODS; TRANSMISSION ELECTRON MICROSCOPY;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; OPERATING CONDITIONS;

CHEMICAL VAPOR DEPOSITION;

EID: 0033188055     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (14)

1. Dollet A. and Caussat B., "A new approach to predict the structure of LPCVD silicon films", this congress (sept. 1999).
2. Berjoan R., Perarnau D. and Caussat B., "XPS study of CVD silicon thin films deposited on various substrates from SiH4 gaseous precursor", this congress (sept. 1999).
3. de Mauduit B., Bourgerette C., Paillard V. and Caussat B., "Structure of mixed-phase LPCVD silicon films as a function of operating conditions", this congress (Sept. 1999).
4. Van der Lee A., Durand J., Cot D. and Vasquez L., "Study of the growth mechanism of CVD silicon films on silica by X-ray reflectivity, atomic force microscopy and scanning electron microscopy", this congress (sept. 1999).
5. Temple-Boyer P., Scheid E., Caussat B., Couderc J.P., de Mauduit B." Correlations between stress and microstructure for LPCVD silicon films ", this congress (sept. 1999).
6. Barathieu P., Couderc J.P., Scheid E., Caussat B. and Jaume D., "Chemical vapor deposition of semiinsulating polycrystalline silicon (SIPOS) : experiment and simulation", this congress (sept. 1999).
7. Duvemeuil P. and Couderc J.P., J. Electrochem. Soc. 139 (1992) 296-304.
8. Communal-Fayolle F., PhD Thesis, INP Toulouse, France (1993).
9. Wilke T.E., Turner K.A. and Takoudis C.J., Chem. E?ig. Sei. 41 (1986) 643-650.
10. Fayolle F., Couderc J.P. and Duverneuil P., CVD 2(6) (19%) 265-275.
11. Guillemet J.P., PhD Thesis, Université de Paris XI, France (1994).
12. Voustas A.T., Halalis M.K., J. Appl. Phys. 76(2) (1994) 777-790.
13. Kirn J.H., Lee J.Y., Nam K.S.,J. Appl. Phys. 79 (1996) 1794.
14. Saga K.and Hattori T., J. Electrochem. Soc. 144(9) (1997) L253-L255.