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Journal De Physique. IV : JP

Volumn 9 pt 2, Issue 8, 1999, Pages

Volatile surfactant assisted MOCVD of oxide materials

(6) Molodyk, A A a Kaul, A R a Gorbenko, O Yu a Novojilov, M A a Korsakov, I E a Wahl, G b

a MOSCOW STATE UNIVERSITY (Russian Federation)

b TECHNICAL UNIVERSITY OF BRAUNSCHWEIG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION; CRYSTAL STRUCTURE; ENERGY DISPERSIVE SPECTROSCOPY; EPITAXIAL GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE ACTIVE AGENTS; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINITY; VOLATILE SURFACTANT;

OXIDES;

EID: 0033188017 PISSN: 11554339 EISSN: None Source Type: Conference Proceeding
DOI: 10.1051/jp4:1999889 Document Type: Article

Times cited : (4)

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