The LPCVD of rutile at low temperatures

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Hitchman, M L ^a   Zhao, J ^a  

^a UNIVERSITY OF STRATHCLYDE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

RAMAN SCATTERING; REFRACTIVE INDEX; SUBSTRATES; TEMPERATURE; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION;

ANATASE; RUTILE; TITANIUM TETRABUTOXIDE;

CHEMICAL VAPOR DEPOSITION;

EID: 0033187907     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999844     Document Type: Article

References (17)

1. [I] P.J. Martin, J. Mater. Sci., 21 (1986) 1
2. H.K. Pu\ker,Appl. Opt., 18 (1979) 1969
3. L.M. William and D.W. Hess. J. Vac. Sci. Techno!., AI (1983) 1810
4. nd ed, 20 ( 1969) 390
5. G. Skinner, H.L. Johnston, and C. Beckett, "Titanium and its Compounds", Johnston Enterprises, Columbus, Ohio, (1940) 21
6. M.L. Hitchman and K.F. Jensen, "Chemical Vapour Deposition - Principles and Applications", Academic Press, (1993)
7. A. Turkovic, M. Ivanda, A. Drasner, V. Vranesa, and M. Persin, Thin Solid Films, 198 ( 1991 ) 199
8. N. Rausch and E.P. Burte, J. Electrochem. Soc., 140 (1993) 145
9. P. Vaija, J. Lahouidak, and J. Durand, European Ceramic Soc., 11 (1993) 551
10. HJ. Frenck, W. Kulisch, M. Kuhr, and R. Kassing, Thin Solid Films, 201 (1991) 327
11. V.A. Versteeg, C.T Avedisian, and R. Raj, J. Am. Ceram. Soc., 78 (1995) 2763
12. M. Ritala, M. Leskela, E. Nykanen, P. Soininen, and L. Niinisto, Thin Solid Films, 225 (1993) 288
13. M.L. Hitchman, J.F. Zhao and S.H. Shamlian, results to be published.
14. ASTM X-ray Powder Data File, American Society for Testing Materials, (1960), Card 21-1250, 21-1272,21-1276
15. th edition (1984)
16. T. Ohsaka, F. Izumi, and Y. Fuliki, J. Raman Spec., 1 (1978) 321
17. S.P.S. Porto, P.A. Fleury, and T.C. Damen, Phys. Rev., 154 (1967)522