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Volumn 55, Issue 10, 1999, Pages 2039-2048
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Self broadening and linestrength determinations in the v2 and v5 bands of CH3F
a
Connecticut C
*
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION SPECTROSCOPY;
ELECTRON TRANSITIONS;
HALOGEN COMPOUNDS;
MATHEMATICAL MODELS;
PRESSURE EFFECTS;
SEMICONDUCTOR LASERS;
TEMPERATURE;
DICKE EFFECT;
GALATRY LINE PROFILE;
LINE STRENGTHS;
METHOD OF EQUIVALENT WIDTHS;
RAUTIAN LINE PROFILE;
SELF BROADENING COEFFICIENTS;
TRICHLOROFLUOROMETHANE;
TUNABLE DIODE LASER MEASUREMENTS;
VOIGT PROFILE;
BAND STRUCTURE;
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EID: 0033187783
PISSN: 13861425
EISSN: None
Source Type: Journal
DOI: 10.1016/S1386-1425(99)00076-1 Document Type: Article |
Times cited : (4)
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References (11)
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