Comparison between patterned and unpatterned electrodeposited spin-valve sensors

IEEE Transactions on Magnetics

Volumn 35, Issue 5 PART 1, 1999, Pages 3094-3096

  Attenborough, Karen ^a,b   Boeve, Hans ^a,b   De Boeck, Jo ^a,b   Borghs, Gustaaf ^a,b   Celis, Jean Pierre ^a,b  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b IMEC   (Belgium)

Author keywords

Anisotropy; Co Cu layers; Electrodeposition; Patterning; Spin valves

Indexed keywords

ANTIFERROMAGNETISM; ELECTRODEPOSITION; MAGNETIC ANISOTROPY; MAGNETIC FILMS; SEMICONDUCTING GALLIUM ARSENIDE;

SPIN-VALVE SENSORS;

SENSORS;

EID: 0033184129     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.801095     Document Type: Article

References (4)

1. K. Attenborough, H. Boeve, J. De Boeck, O. Borghs, J.-P. Celis, Electrodeposited Spin-Valves Appl. Phy. Lett., vol. 74, pp. 2206-2208, 1999.
2. K. Attenborough, H. Boeve, J. De Boeck, G. Borghs, J.-P. Celis, Ultrasensitive spin-valve structures grown on n-OaAs by single bath electrodeposition, Sensors and Actuators A, 1999, in press.
3. J.C.S. Kools, Exchange-Biased Spin-Values for Magnetic Storage, IEEE Trans. Magn., vol. 32, pp. 3165-3184, 1996.
4. M. Cerisier, Dept. MTM, Katholieke Uuniveristy Leuven, personal Communication, 1998.