Effect of ir content and sputtering conditions on unidirectional anisotropy of ni-fe/mn-ir films fabricated under the extremely clean sputtering process

IEEE Transactions on Magnetics

Volumn 35, Issue 5 PART 2, 1999, Pages 3919-3921

  Yagami, Kojiro ^a   Tsunoda, Masakiyo ^b   Sugano, Satoshi ^c   Takahashi, Migaku ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b SONY CORPORATION   (Japan)

^c DAIDO STEEL CO LTD   (Japan)

Author keywords

Exchange anlsotropy; Extremely clean sputtering; Ir content; Mn ir; Sputtering conditions

Indexed keywords

COMPOSITION EFFECTS; MAGNETIC ANISOTROPY; MANGANESE ALLOYS; NICKEL ALLOYS; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

EXTREMELY CLEAN SPUTTERING;

MAGNETIC FILMS;

EID: 0033183849     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.800708     Document Type: Article

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