Overdamped NbN Josephson junctions based on Nb/AlOx/Nb trilayer technology

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 8 B, 1999, Pages

  Iwai, Takao ^a   Aoyama, Takashi ^a   Oke, Ryutaro ^a   Akaike, Hiroyuki ^a   Fujimaki, Akira ^a   Hayakawa, Hisao ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CURRENT VOLTAGE CHARACTERISTICS; FABRICATION; FILM PREPARATION; MAGNETRON SPUTTERING; NIOBIUM COMPOUNDS; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SPUTTER DEPOSITION; SUPERCONDUCTING FILMS;

FILM THICKNESS; JUNCTION UNIFORMITY; OVERDAMPED JUNCTION; TRILAYER TECHNOLOGY;

JOSEPHSON JUNCTION DEVICES;

EID: 0033175389     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l929     Document Type: Article

References (9)