Electron emission from a heteroepitaxial diamond planar emitter

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 8 B, 1999, Pages

  Yamada, Takatoshi ^a   Maede, Jun ^a   Sawabe, Atsuhito ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON EMISSION; IRRADIATION; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS;

DIAMOND EMITTER; DIRECT CURRENT CHEMICAL VAPOR DEPOSITION; EMISSION UNIFORMITY; HETEROEPITAXIAL DIAMOND; ION IRRADIATION; POLYCRYSTALLINE DIAMOND;

SEMICONDUCTING DIAMONDS;

EID: 0033173996     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l902     Document Type: Article

References (11)