High-temperature behavior of SiO2 at grain boundaries in TZP

Interface Science

Volumn 7, Issue 2, 1999, Pages 77-84

  Ikuhara, Y ^a   Nagai, Y ^a   Yamamoto, T ^a   Sakuma, T ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL BONDS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; FUSED SILICA; GRAIN BOUNDARIES; MOLECULAR DYNAMICS; POLYCRYSTALS; QUENCHING; SINTERING; TRANSMISSION ELECTRON MICROSCOPY; ZIRCONIA;

MOLECULAR ORBITAL CALCULATION; TETRAGONAL ZIRCONIA POLYCRYSTAL;

INTERFACES (MATERIALS);

EID: 0033171889     PISSN: 09277056     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1008777500697     Document Type: Article

References (12)

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