Depth profiles of boron and hydrogen in boron-doped diamond films and related performance characteristics

Diamond and Related Materials

Volumn 8, Issue 7, 1999, Pages 1229-1233

  Liao, C ^a   Wang, Y ^b   Yang, S ^a  

^a LANZHOU UNIVERSITY   (China)

^b UNIVERSITY OF MINNESOTA   (United States)

Author keywords

Boron profile; Boron doped; Diamond film; Hydrogen profile

Indexed keywords

ADSORPTION; BORON; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; DIFFUSION; DOPING (ADDITIVES); HYDROGEN;

DEPTH PROFILES; ELASTIC RECOIL DETECTION ANALYSIS; NUCLEAR REACTION ANALYSIS; RAMAN SHIFT;

DIAMOND FILMS;

EID: 0033165093     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00127-2     Document Type: Article

References (16)

1. Gildenblat G.Sh., Grot S.A., Badzian A. Proc. IEEE. 79:1991;647. and references therein.
2. Glesener J.W. Appl. Phys. Lett. 63:1993;767.
3. Fujimori N. New Diamond. 2:1986;10.
4. Gildenblat G.Sh., Grot S.A., Wronski C.R., Bazian A.R., Badzian T., Messier R. Appl. Phys. Lett. 53:1988;586.
5. Pan L.S., Kania D.R., Pianetta P., Landen O.N. Appl. Phys. Lett. 57:1990;623.
6. Nishmura K., Das K., Glass J.T. J. Appl. Phys. 69:1991;3142.
7. Zhang K., Guo J.G., Yao Y.F., Wang R., Chen G.M., Zhou W.K., Yu S. Appl. Phys. 56:1993;425.
8. Werner M., Dorsch O., Baerwind H.U., Obermeier E., Hase L., Seifert W., Ringhandt A., Johnston C., Romani S., Bishop H., Chalker P.R. Appl. Phys. Lett. 64:1994;595.
9. Zhang R.J., Lee S.T., Lam Y.W. Diamond Relat. Mater. 5:1996;1288.
10. Lamaze G.P., Downing R.G., Pilione L., Badzian A., Badzian T. Appl. Surf. Sci. 65/66:1993;587.
11. Lamaze G.P., Downing R.G. Proc. Int. Workshop on Semiconductor Characterization: Present and Future Needs. 1996;351-355 AIP Press, Woodbury, NY.
12. Zhang F.Q., Zhang N.P., Xie E.Q., Yang B., Yang Y.H., Chen G.H., Jiang X.L. Thin Solid Films. 216:1992;279.
13. Liao C.G., Jiang H., Wang Y.Q., Zheng Z.H. Nucl. Instrum. Meth. B. 95:1995;97.
14. Liao C.G., Wang Y.Q., Yang S.S. Nucl. Instrum. Meth. A. 422:1999;863.
15. Wang Y.Q., Liao C.G., Yang S.S., Zheng Z.H. Nucl. Instrum. Meth. B. 47:1990;427.
16. C.G. Liao, Y.Q. Wang, S.S. Yang, X.M. Chen, Vacuum, submitted.