Reduction of electron temperature in rf plasma using magnetic filter

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4301-4304

  Hayashi, Nobuya ^a   Nakashima, Toshio ^a   Fujita, Hiroharu ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON ENERGY ANALYZERS; ELECTRON ENERGY LEVELS; MAGNETIC FILTERS; PLASMA SOURCES; TEMPERATURE;

CYLINDRICAL LANGMUIR PROBE; ELECTRON ENERGY DISTRIBUTION FUNCTIONS; ELECTRON TEMPERATURE REDUCTION; ELECTROSTATIC ENERGY ANALYZER; ION HOLE PARAMETER; NEUTRAL BEAM INJECTION; RADIO FREQUENCY PLASMA;

SEMICONDUCTOR PLASMAS;

EID: 0033157766     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4301     Document Type: Article

References (11)

1. K. Kato, S. Iizuka and N. Sato: Appl. Phys. Lett. 65 (1994) 816.
2. A. Y. Wong, D. L. Mamas and D. Arnush: Phys. Fluids 18 (1975) 1489.
3. K. W. Ehlers and K. N. Leung: Rev. Sci. Instrum. 52 (1981) 1452.
4. H. Amemiya: Jpn. J. Appl. Phys. 30 (1991) 2601.
5. O. Fukumasa: Trans. IEE Jpn. 111-A (1991) 1057.
6. N. Hayashi, D. Satake and H. Fujita: Bull. Am. Phys. Soc. 43 (1998) 1493.
7. R. J. Taylor, K. R. Mackenzie and H. Ikezi: Rev. Sci. Instrum. 43 (1972) 1675.
8. J. R. Smith, N. Hershkowitz and P. Coakley: Rev. Sci. Instrum. 50 (1979) 210.
9. O. Fukumasa, Y. Tauchi, N. Mizuki and M. Matsumori: Proc. 4th Int. Conf. Reactive Plasmas and 16th Symp. Plasma Processing (Hawaii, 1998) p. 307.
10. A. J. T. Holmes: Rev. Sci. Instrum. 53 (1982) 1517.
11. O. Fukumasa, H. Naitou and S. Sakiyama: Jpn. J. Appl. Phys. 30 (1991) L1063.