Characteristics of electron density in ablation plasma generated from functionally graded material in excimer laser processing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4400-4403

  Uchida, Yoshihisa ^a   Yamada, Jun ^a   Furuhashi, Hideo ^a   Uchida, Yoshiyuki ^a  

^a AICHI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CERAMIC MATERIALS; EXCIMER LASERS; INTERFEROMETERS; LASER ABLATION; LASER PULSES; METALS; SURFACE TREATMENT; XENON;

ABLATION PLASMA; FUNCTIONALLY GRADED MATERIAL; MACH-ZEHNDER INTERFEROMETER; MICROPROCESSING; SPATIAL PROFILES; TEMPORAL PROFILES; WAVELENGTH;

PLASMAS;

EID: 0033157661     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4400     Document Type: Article

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