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Thin Solid Films

Volumn 346, Issue 1, 1999, Pages 96-99

Formation of cubic C3N4 thin films by plasma enhanced chemical vapor deposition

(6) Zhang, Zhihong a Guo, Huaixi a Zhong, Guirong a Yu, Feiwei a Xiong, Qihua a Fan, Xiangjun a

a WUHAN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

FILM PREPARATION; NITRIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CUBIC CARBON NITRIDE;

THIN FILMS;

EID: 0033149166 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)01457-6 Document Type: Article

Times cited : (24)

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