Measurement of temperature fluctuations and microscopic growth rates in a silicon floating zone under microgravity

Journal of Crystal Growth

Volumn 203, Issue 4, 1999, Pages 500-510

  Schweizer, M ^a   Croll A ^b   Dold, P ^a   Kaiser, Th ^a   Lichtensteiger, M ^c   Benz, K W ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

^b UNIVERSITY OF ALABAMA IN HUNTSVILLE   (United States)

^c NASA MARSHALL SPACE FLIGHT CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIMONY; DOPING (ADDITIVES); INTERFACES (MATERIALS); MICROGRAVITY PROCESSING; MICROSCOPIC EXAMINATION; SENSORS; SILICON; TEMPERATURE MEASUREMENT;

CONVECTIVE TEMPERATURE FLUCTUATIONS; DIFFERENTIAL INTERFERENCE CONTRAST MICROSCOPY; FLOATING ZONE TECHNIQUE; GROWTH RATE FLUCTUATIONS; MARANGONI CONVECTION; SPREADING RESISTANCE MEASUREMENT;

CRYSTAL GROWTH FROM MELT;

EID: 0033149096     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00155-4     Document Type: Article

References (28)

1. Cröll A., Müller-Sebert W., Benz K.W., Nitsche R. Microgravity Sci. Technol. III/. 4:1991;204.
2. Cröll A., Kaiser Th., Schweizer M., Danilewsky A.N., Lauer S., Tegetmeier A., Benz K.W. J. Crystal Growth. 191:1998;365.
3. Müller G., Rupp R. Crystal Properties and Preparation. 35:1991;138.
4. Levenstam M., Amberg G., Carlberg T., Andersson M. J. Crystal Growth. 158:1996;224.
5. Th. Kaiser, A. Cröll, P. Dold, K.W. Benz, Proceedings of the Second European Symposium Fluids in Space, Naples, 1996, p. 245.
6. Cröll A., Dold P., Benz K.W. J. Crystal Growth. 137:1994;95.
7. Schwabe D., Velten R., Scharmann A. J. Crystal Growth. 99:1990;1258.
8. Frank S., Schwabe D. Experiments in Fluids. 23:1997;234.
9. Nakamura S., Hibiya T., Kakimoto K., Imaishi N., Nishizawa S., Hirata A., Mukai K., Yoda S., Morita T. J. Crystal Growth. 186:1998;85.
10. P. Dold, A. Cröll, M. Schweizer, Th. Kaiser, K.W. Benz, F. Szofran, S. Nakamura, T. Hibiya, Proceedings of the 49th International Astronautical Congress, Melbourne, 1998, IAF-98-J.3.03.
11. Jurisch M. J. Crystal Growth. 102:1990;223.
12. Kaiser Th., Benz K.W. J. Crystal Growth. 183:1998;564.
13. Carlberg T. J. Crystal Growth. 85:1987;32.
14. van Run A. J. Crystal Growth. 47:1979;680.
15. Garandet J.P. J. Crystal Growth. 131:1993;431.
16. Murgai A., Gatos H.C., Witt A.F. J. Electrochem. Soc. 123:1976;224.
17. Kim K.M., Witt A.F., Gatos H.C. J. Electrochem. Soc. 119:1972;1218.
18. Kim K.M., Witt A.F., Lichtensteiger M., Gatos H.C. J. Electrochem. Soc. 125:1978;475.
19. P. Dold, Ph.D. Thesis, University of Freiburg, 1994.
20. B.M. Turowski, M.G. Milwidski, Phys. Abhandlungen aus der Sowjetunion 6 (1962) 199 (in German) Original in: ΦTT 3 (1961) 2519 (in Russian).
21. B.M. Turowski, M.G. Milwidski, Phys. Abhandlungen aus der Sowjetunion 6 (1962) 199 (in German) Original in: ΦTT 3 (1961) 2519 (in Russian).
22. Mühlbauer A., Muiznieks A., Raming G., Riemann H., Lüdke A. J. Crystal Growth. 198/199:1999;107.
23. Dold P., Benz K.W. Cryst. Res. Technol. 30:1995;1135.
24. W. Heywang, Z. Naturforsch. 11a (1956) 238.
25. Wright Jenkins M. J. Electrochem. Soc. 124:1977;757.
26. M.S. Engelman, Fidap 7.6. Fluid Dynamics Inc., Evanston, Illinois, 1998.
27. Th. Kaiser, Ph.D. Thesis, University of Freiburg 1998, Shaker Verlag, Aachen, 1998.
28. Thevenard D., Rouzaud A., Coméra J., Favier J.J. J. Crystal Growth. 108:1991;572.