Maskless ion beam lithography system

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 469-472

  Lee, Y ^a   Gough, R A ^a   King, T J ^a   Ji, Q ^a   Leung, K N ^a   McGill, R A ^a   Ngo, V V ^a   Williams, M D ^a   Zahir, N ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; ION SOURCES;

MULTICUSP ION SOURCES;

ION BEAM LITHOGRAPHY;

EID: 0033132680     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00042-8     Document Type: Article

References (5)

1. 1. S. Minne et. al., Appl. Phys. Lett., Vol. 66, No. 6, pp. 703-705, 1995.
2. 2. W. Bruenger, et. al., paper to be submitted at the Micro-and-Nano Engineering 98, Leuven, Belgium, September 22-24, 1998.
3. 3. Y. Lee, et. al., presented at the Electron, Ion and Proton Beam and Nanofabrication '98, Chicago, Illinois, May 26-29 1998.
4. 4. Y. Lee, et. al., Nucl. Instrum. and Meth. A374, pp 1-6, 1996.
5. 5. M. Sarstedt, private communications.