Data analysis for photolithography

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 65-68

  Mack, Chris A ^a   Legband, Dale A ^a   Jug, Sven ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURVE FITTING; DATA REDUCTION; DATA STRUCTURES; LEAST SQUARES APPROXIMATIONS; MATRIX ALGEBRA; NONLINEAR EQUATIONS; STATISTICAL TESTS;

PHOTORESIST CONTRAST CURVES;

PHOTORESISTS;

EID: 0033132117     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00016-7     Document Type: Article

References (10)

1. 1. C. P. Ausschnitt, Optical/Laser Microlith. II, Proc., SPIE Vol. 1088 (1989) pp. 115-133.
2. 2. P. G. Drennan, OCG Microlith. Seminar Interface '93 (1993) pp. 229-241.
3. 3. R. A. Ferguson, R. M. Martino, and T. A. Brunner, J. Vac. Sci. Technol., Vol B15, No. 6 (Nov/Dec 1997) pp. 2387-2393.
4. 4. F. Hurter and V. C. Driffield, Jour. Soc. Chemical Industry (May 31, 1890) pp. 455-469.
5. 5. C. A. Mack, KTI Microlith. Seminar, Proc., (1990) pp. 1-12, and Microelec. Manufact. Tech., Vol. 14, No. 1 (Jan. 1591) pp. 36-42.
6. 5. C. A. Mack, KTI Microlith. Seminar, Proc., (1990) pp. 1-12, and Microelec. Manufact. Tech., Vol. 14, No. 1 (Jan. 1591) pp. 36-42.
7. 6. ASTM Standard F1059-87, American Society for Testing and Materials (Philadelphia, 1987).
8. 7. D. H. Ziger and C. A. Mack, AICHE Journal, Vol. 37, No. 12 (Dec 1991) pp. 1863-1874.
9. 8. C. A. Mack, Microlithography World, Vol. 3, No. 2 (Spring 1994) pp. 22-24.
10. 9. C. A. Mack, Microlithography World, Vol. 3, No. 3 (Summer 1994) pp. 23-25.