Optical proximity correction by e-beam over-correction

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 55-58

  Lin, C H ^a   Tzu, S D ^a   Yen, Anthony ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE ATTENUATION; ELECTRON BEAMS; LIGHT SCATTERING; MASKS; SCANNING ELECTRON MICROSCOPY;

ATTENUATED PHASE SHIFTING MASKS (APSM); OPTICAL PROXIMITY CORRECTION (OPC);

PHOTORESISTS;

EID: 0033131704     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00014-3     Document Type: Article

References (3)

1. (1) D.F. Kyser and N.S. Viswanathan, J. Vac. Sci. Technol. 12(6), 1305(1975)
2. (2) F. Murai, H. Yoda, S. Okazaki, N. Saitou, and Y. Sakitani, J. Vac. Sci. Technol. B 10(6), Nov/Dec 1992
3. (3) T. Kamikubo,et al, Jpn. J. Appl. Phys. Vol.36(1997) Part 1, No. 12B, December 1997