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Volumn 10, Issue 2, 1999, Pages 141-144

Criteria for uniform thin film formation for polymeric materials

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; ELECTRON BEAM LITHOGRAPHY; MATHEMATICAL MODELS; POLYMERS; SURFACE ROUGHNESS; VISCOSITY;

EID: 0033115814     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1008920316701     Document Type: Article
Times cited : (9)

References (22)
  • 2
    • 0344461991 scopus 로고
    • Polymers for High Technology, Electronics and Photonics
    • edited by M. J. Bowden and S. R. Turner American Chemical Society, Washington DC
    • S. A. JENEKHE, "Polymers for High Technology, Electronics and Photonics" ACS Symposium Series 346, edited by M. J. Bowden and S. R. Turner (American Chemical Society, Washington DC, 1986) p. 261.
    • (1986) ACS Symposium Series , vol.346 , pp. 261
    • Jenekhe, S.A.1
  • 3
    • 0345324854 scopus 로고
    • edited by M. S. Htoo Marcel Dekker Inc, New York and Basel
    • S. NONOGAKI, in "Microelectronic Polymers", edited by M. S. Htoo (Marcel Dekker Inc, New York and Basel, 1989) p. 79.
    • (1989) Microelectronic Polymers , pp. 79
    • Nonogaki, S.1
  • 10
    • 0345324850 scopus 로고
    • Research and Education Association Press, New York
    • M. FOGIEL, "Modern Microelectronics" (Research and Education Association Press, New York, 1972).
    • (1972) Modern Microelectronics
    • Fogiel, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.