Ultraviolet laser-induced formation of thin silicon oxide film from the precursor β-chloroethyl silsesquioxane

Journal of Materials Research

Volumn 14, Issue 3, 1999, Pages 990-994

  Sharma, Jaya ^a   Berry, Donald H ^a   Composto, Russell J ^a   Dai, Hai Lung ^a  

^a UNIVERSITY OF PENNSYLVANIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; DEPOSITION; LASER PULSES; OXIDES; QUARTZ; REFRACTIVE INDEX; SILICON; SILICON COMPOUNDS; SODIUM CHLORIDE; THIN FILMS; ULTRAVIOLET RADIATION;

CHLOROETHYL SILSESQUIOXANE; THIN SILICON OXIDE FILM;

PROTECTIVE COATINGS;

EID: 0033098783     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0132     Document Type: Article

References (14)

1. S.K. Gupta and R.L. Chin, in ACS Symposium Series, 295, Washington, DC, 1986.
2. K. Inoue, M. Michimori, M. Okuyama, and Y. Hamakawa, Jpn. J. Appl. Phys. 26, 805 (1987).
3. Y. Toyoda, K. Inoue, M. Okuyama, and Y. Hamakawa, Jpn. J. Appl. Phys. 26, 835 (1987).
4. J. Marks and R.E. Robertson, Appl. Phys. Lett. 52, 810 (1988).
5. P. Gonzalez, D. Fernandez, J. Pou, E. Garcia, J. Serra, B. Leon, and M. Perez-Amor, Thin Solid Films 218, 170 (1992).
6. M. Niwano, S. Hirano, M. Suemitsu, K. Honma, and N. Miyamoto, Jpn. J. Appl. Phys. 28, L1310 (1989).
7. Pulsed Laser Deposition of Thin Films, edited by D.B. Chrisey and G.K. Hubler (John Wiley & Sons, Inc., New York, 1994).
8. R.J. Muisener and J.T. Koberstein, Polym. Mater. Sci. Eng. 77, 653 (1997).
9. (a) L.K. Figge, Ph.D. Dissertation, University of Pennsylvania (1996);
10. (b) B. Arkles, D.H. Berry, L.K. Figge, R.J. Composto, T. Chiou, H. Colazzo, and W.E. Wallace, Sol-Gel Sci. Technol. 8, 465 (1997).
11. F.L. McCrackin, A Fortran Program for Analysis of Ellipsometer Measurements (Natl. Bur. Stand. Tech. Note 479, 1969).
12. 4He ions incident on a carbon target. Rutherford cross section is the theoretical cross section based on a Coulomb interaction potential between the incident particle and target atom.
13. E. Fogarassy, C. Fudes, A. Slaoui, S. De Unamuno, J.P. Stoquert, and B. Lang, J. Appl. Phys. 76, 2612 (1994).
14. J. Sharma and H.L. Dai, unpublished results.