Selective growth of semi-insulating InP around masked nonplanar structures using low-pressure pulsed metallorganic epitaxy

Journal of the Electrochemical Society

Volumn 146, Issue 3, 1999, Pages 1167-1171

  Bertone, D ^a   Fang, R Y ^a   Morello, G ^a   Meliga, M ^a  

^a CSELT   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; IRON; MASKS; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING; SEMICONDUCTOR GROWTH; THERMAL EFFECTS;

PULSED METALLORGANIC EPITAXY (PME); WET CHEMICAL ETCHING;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0033098610     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391740     Document Type: Article

References (11)