Influence of magnetron configuration on CoCr films sputtered on flexible substrates

Journal of Magnetism and Magnetic Materials

Volumn 193, Issue 1-3, 1999, Pages 128-131

  Veldeman, J ^a   Jia, H ^a   Burgelman, M ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

DC magnetron sputtering; Ion bombardment; Longitudinal magnetic thin films; PET substrate

Indexed keywords

CHROMIUM; COBALT COMPOUNDS; ION BOMBARDMENT; MAGNETIC PROPERTIES; MAGNETRON SPUTTERING; POLYETHYLENE TEREPHTHALATES; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

LONGITUDINAL MAGNETIC THIN FILMS; MAGNETRON CONFIGURATION;

MAGNETIC THIN FILMS;

EID: 0033098272     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(98)00416-8     Document Type: Article

References (11)

1. B. Chapman, Glow Discharge Processes, 1980, p. 215.
2. A.S. Penfold, Magnetron sputtering, Handbook of Thin Film Process Technology, 1995, A.3.2.
3. E. Sheridan et al., J. Vac. Sci. Technol. A 8 (1) (1990) 30.
4. N. Savvides, B. Window, J. Vac. Sci. Technol. A 4 (3) (1986) 504.
5. B. Window, N. Savvides, J. Vac. Sci. Technol. A 4 (2) (1986) 196.
6. H. Jia, J. Veldeman, M. Burgelman, Presented at MRM'98.
7. T. Kawanabe et al., IEEE Trans. Magn. MAG-27 (1991) 5031.
8. D.W. Hoffman, J. Vac. Sci. Technol. A 12 (4) (1994) 953.
9. J. Nakai et al., IEEE Trans. Magn. MAG-31 (1995) 2833.
10. Y. Deng et al., IEEE Trans. Magn. MAG-29 (1993) 3676.
11. K. Sin et al., IEEE Trans. Magn. MAG-30 (1994) 4008.