Effects of developer exhaustion on the sensitometric properties of four dental films

Dentomaxillofacial Radiology

Volumn 28, Issue 2, 1999, Pages 80-88

  Syriopoulos, K ^a   Velders, X L ^a   Sanderink, G C H ^a   Van Ginkel, F C ^a   Van der Stelt, P F ^a  

^a UNIVERSITY OF AMSTERDAM   (Netherlands)

Author keywords

Radiography, dental; X ray film

Indexed keywords

ANALYSIS OF VARIANCE; ARTICLE; CHEMISTRY; COMPARATIVE STUDY; HUMAN; INSTRUMENTATION; METHODOLOGY; OXIDATION REDUCTION REACTION; RADIOLOGY; SOLUTION AND SOLUBILITY; STANDARD; TOOTH RADIOGRAPHY; X RAY FILM;

ANALYSIS OF VARIANCE; HUMANS; OXIDATION-REDUCTION; RADIOGRAPHY, DENTAL; SOLUTIONS; TECHNOLOGY, RADIOLOGIC; X-RAY FILM;

EID: 0033089371     PISSN: 0250832X     EISSN: None     Source Type: Journal    
DOI: 10.1038/sj.dmfr.4600416     Document Type: Article

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