Analysis of heat transfer in a chemical vapor deposition reactor: An eigenfunction expansion solution approach

International Journal of Heat and Fluid Flow

Volumn 20, Issue 1, 1999, Pages 74-83

  Chang, Hsiao Yung ^a   Adomaitis, Raymond A ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

Chemical vapor deposition; Collocation; Eigenfunction expansions; Weighted residual methods

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; EIGENVALUES AND EIGENFUNCTIONS; ENTHALPY; HEAT FLUX; HEAT TRANSFER COEFFICIENTS; MATHEMATICAL MODELS; TEMPERATURE DISTRIBUTION;

COLLOCATION METHOD; WEIGHTED RESIDUAL METHODS;

HEAT TRANSFER;

DEPOSITION; GAS; HEAT TRANSFER; STEADY FLOW;

EID: 0033080433     PISSN: 0142727X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0142-727X(98)10042-5     Document Type: Article

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