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Volumn 46, Issue 2, 1999, Pages 431-433

An improved drain-current-conductance method with substrate back-biasing

Author keywords

Body effect; Channel mobility; MOSFET; Parameter extraction; Series resistance

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTANCE; ELECTRIC RESISTANCE; SUBSTRATES;

EID: 0033079570     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.740913     Document Type: Article
Times cited : (7)

References (9)
  • 2
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    • "Analysis of the gate-voltage-dependent series resistance of MOSFET's,"
    • K. K. Ng and W. T. Lynch, "Analysis of the gate-voltage-dependent series resistance of MOSFET's," IEEE Trans. Electron Devices, Vol. ED33, p. 965, July 1986.
    • (1986) IEEE Trans. Electron Devices, Vol. ED , vol.33 , pp. 965
    • Ng, K.K.1    Lynch, W.T.2
  • 3
    • 0023570547 scopus 로고
    • "Gate-voltage dependent effective channel length and series resistance of EDD MOSFET's,"
    • G. J. Hu, C. Chang, and Y. T. Chia, "Gate-voltage dependent effective channel length and series resistance of EDD MOSFET's," IEEE Trans. Electron Devices, Vol. ED34, p. 2469, Dec. 1987.
    • (1987) IEEE Trans. Electron Devices, Vol. ED , vol.34 , pp. 2469
    • Hu, G.J.1    Chang, C.2    Chia, Y.T.3
  • 4
    • 0027656616 scopus 로고
    • "A new approach to determine the drain-andsource resistance of EDD MOSFET's,"
    • S. S. Chung and J. S. Eee, "A new approach to determine the drain-andsource resistance of EDD MOSFET's," IEEE Trans. Electron Devices, vol. 40, p. 1709, Sept. 1993.
    • (1993) IEEE Trans. Electron Devices , vol.40 , pp. 1709
    • Chung, S.S.1    Eee, J.S.2
  • 5
    • 0032094851 scopus 로고    scopus 로고
    • "A novel singledevice dc method for extraction of the effective mobility and sourcedrain resistances of fresh and hot-carrier degraded drain-engineered MOSFET's,"
    • C. E. Eou, W. K. Chim, D. S. H. Chan, and Y. Pan, "A novel singledevice dc method for extraction of the effective mobility and sourcedrain resistances of fresh and hot-carrier degraded drain-engineered MOSFET's," IEEE Trans. Electron Devices, vol. 45, p. 1317, June 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , pp. 1317
    • Eou, C.E.1    Chim, W.K.2    Chan, D.S.H.3    Pan, Y.4
  • 6
    • 0032049972 scopus 로고    scopus 로고
    • "Back-gate bias enhanced band-to-band tunneling leakage in scaled MOSFET's,"
    • M. J. Chen, H. T. Huang, C. S. Hou, and K. N. Yang, "Back-gate bias enhanced band-to-band tunneling leakage in scaled MOSFET's," IEEE Electron Device Lett., vol. 19, p. 134, Apr. 1998.
    • (1998) IEEE Electron Device Lett. , vol.19 , pp. 134
    • Chen, M.J.1    Huang, H.T.2    Hou, C.S.3    Yang, K.N.4
  • 7
    • 0023587323 scopus 로고
    • "Accurate criterion for MOSFET effective gate length extraction using the capacitance method," in
    • J. Scarpulla, T. C. Mêle, and J. P. Kruius, "Accurate criterion for MOSFET effective gate length extraction using the capacitance method," in IEDM Tech. Dig., 1987, p. 722.
    • (1987) IEDM Tech. Dig. , pp. 722
    • Scarpulla, J.1    Mêle, T.C.2    Kruius, J.P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.